Invention Grant
- Patent Title: Workpiece processing device and method
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Application No.: US17187538Application Date: 2021-02-26
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Publication No.: US11504869B2Publication Date: 2022-11-22
- Inventor: Takahiro Iida , Teruhiko Nishikawa , Tasuku Shimizu
- Applicant: Tokyo Seimitsu Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee: Tokyo Seimitsu Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2019-040657 20190306,JP2020-035650 20200303,JP2020-035651 20200303
- Main IPC: B24B51/00
- IPC: B24B51/00 ; B26D3/06 ; B26D5/00 ; B26D7/01 ; B24B19/02 ; B23Q15/26 ; B23Q17/24 ; B23C3/28

Abstract:
A workpiece processing device includes a workpiece supporting unit configured to support a workpiece so that the workpiece is rotatable around a first axis parallel to a central axis of the workpiece, a cutting unit having a blade configured to cut a surface of the workpiece, a detecting unit configured to calculate a position of a vertex of the surface in a direction along a second axis which is perpendicular to the first axis and parallel to the blade, and a control unit configured to control the workpiece supporting unit so that a cutting position on the surface is located at a vertex in the direction along the second axis, and relatively move the workpiece supporting unit and the cutting unit so that an incision direction of the blade is on a plane defined by the central axis and the cutting position, thereby forming a groove at the cutting position.
Public/Granted literature
- US20210178550A1 WORKPIECE PROCESSING DEVICE AND METHOD Public/Granted day:2021-06-17
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