Invention Grant
- Patent Title: Apparatus for and method of manufacturing semiconductor device
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Application No.: US16714344Application Date: 2019-12-13
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Publication No.: US11512389B2Publication Date: 2022-11-29
- Inventor: Keewon Kim , Daehan Kim , Minkyung Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2019-0032027 20190320,KR10-2019-0075870 20190625
- Main IPC: C23C14/54
- IPC: C23C14/54 ; C23C14/56 ; C23C14/24 ; H01L51/05

Abstract:
Disclosed are an apparatus for and a method of manufacturing a semiconductor device. The apparatus includes a chamber, an evaporator that evaporates an organic source to provide a source gas on a substrate in the chamber, a vacuum pump that pumps the source gas and air from the chamber, an exhaust line between the vacuum pump and the chamber, and an analyzer connected to the exhaust line. The analyzer detects a derived molecule produced from the organic source and determines a replacement time of the evaporator.
Public/Granted literature
- US20200299829A1 APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2020-09-24
Information query
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