Invention Grant
- Patent Title: Stage and substrate processing apparatus
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Application No.: US16797176Application Date: 2020-02-21
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Publication No.: US11521837B2Publication Date: 2022-12-06
- Inventor: Shingo Koiwa
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JPJP2019-032009 20190225
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H02N13/00 ; H01L21/683

Abstract:
There is provision of a stage including a base; a substrate mount section provided above an upper surface of the base; an annular member mount section provided above the upper surface of the base, so as to surround a periphery of the substrate mount section; a first bonding layer bonding the base and the substrate mount section; a second bonding layer bonding the base and the annular member mount section; an annular member disposed on the annular member mount section; and a sealing member configured to protect the first bonding layer and the second bonding layer.
Public/Granted literature
- US20200273680A1 STAGE AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2020-08-27
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