- 专利标题： Sample support, sample ionization method, and mass spectrometry method
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申请号： US17262596申请日： 2019-06-19
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公开(公告)号： US11521843B2公开(公告)日： 2022-12-06
- 发明人: Miu Takimoto , Takayuki Ohmura , Masahiro Kotani
- 申请人： HAMAMATSU PHOTONICS K.K.
- 申请人地址： JP Hamamatsu
- 专利权人： HAMAMATSU PHOTONICS K.K.
- 当前专利权人： HAMAMATSU PHOTONICS K.K.
- 当前专利权人地址： JP Hamamatsu
- 代理机构： Faegre Drinker Biddle & Reath LLP
- 优先权： JPJP2018-142328 20180730
- 国际申请： PCT/JP2019/024361 WO 20190619
- 国际公布： WO2020/026629 WO 20200206
- 主分类号： H01J49/04
- IPC分类号： H01J49/04 ; H01J49/00
摘要：
A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.
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