- 专利标题: Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
-
申请号: US16965753申请日: 2019-01-15
-
公开(公告)号: US11525737B2公开(公告)日: 2022-12-13
- 发明人: Maarten Jozef Jansen
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP18154460 20180131,EP18197177 20180927
- 国际申请: PCT/EP2019/050848 WO 20190115
- 国际公布: WO2019/149515 WO 20190808
- 主分类号: G01B9/02002
- IPC分类号: G01B9/02002 ; G01J9/02 ; G01B11/00 ; G03F7/00 ; G03F7/20 ; G01B9/02001 ; G01B9/02015
摘要:
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
公开/授权文献
信息查询