Invention Grant
- Patent Title: Nozzle, substrate processing apparatus including the same, and substrate processing method
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Application No.: US17009051Application Date: 2020-09-01
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Publication No.: US11529655B2Publication Date: 2022-12-20
- Inventor: Sunmi Kim , Oh Jin Kwon , Sehyeong Choi
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0108097 20190902
- Main IPC: B08B13/00
- IPC: B08B13/00 ; B08B3/02 ; B08B6/00 ; B08B7/04

Abstract:
The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
Public/Granted literature
- US20210060622A1 NOZZLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD Public/Granted day:2021-03-04
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