Invention Grant
- Patent Title: Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
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Application No.: US16653018Application Date: 2019-10-15
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Publication No.: US11542362B2Publication Date: 2023-01-03
- Inventor: Robert Liska , Christian Gorsche , György Harakaly , Markus Kury , Jürgen Stampfl , Peter Dorfinger , Yan Chen , Chunhua Li , Srinivas Kaza
- Applicant: Align Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Align Technology, Inc.
- Current Assignee: Align Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Polsinelli PC
- Main IPC: C08G18/81
- IPC: C08G18/81 ; C08G18/75 ; A61K6/083 ; A61C7/00 ; C08F236/02 ; B33Y80/00 ; A61C7/08 ; A61C7/10 ; C08G18/10 ; C08G18/32 ; C08G18/44 ; C08G18/73 ; C08G18/34 ; C08J5/00
Abstract:
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
Public/Granted literature
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