- 专利标题： Semiconductor device, systems and methods of manufacture
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申请号： US16747652申请日： 2020-01-21
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公开(公告)号： US11545503B2公开(公告)日： 2023-01-03
- 发明人: Taekyung Kim , Kwang Soo Seol , Seong Soon Cho , Sunghoi Hur , Jintae Kang
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Suwon-si
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si
- 代理机构： Muir Patent Law, PLLC
- 优先权： KR10-2013-0105006 20130902
- 主分类号： H01L27/11582
- IPC分类号： H01L27/11582 ; H01L27/1157 ; H01L29/423 ; H01L27/11519 ; H01L29/792
摘要：
A semiconductor memory device includes a stack of word lines and insulating patterns. Cell pillars extend vertically through the stack of word lines and insulating patterns with memory cells being formed at the junctions of the cell pillars and the word lines. A ratio of the thickness of the word lines to the thickness of immediately neighboring insulating patterns is different at different locations along one or more of the cell pillars. Related methods of manufacturing and systems are also disclosed.
公开/授权文献
- US20200152643A1 SEMICONDUCTOR DEVICE, SYSTEMS AND METHODS OF MANUFACTURE 公开/授权日：2020-05-14
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