Invention Grant
- Patent Title: Memory array structures and methods for determination of resistive characteristics of access lines
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Application No.: US17011018Application Date: 2020-09-03
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Publication No.: US11557341B2Publication Date: 2023-01-17
- Inventor: Dan Xu , Jun Xu , Erwin E. Yu , Paolo Tessariol , Tomoko Ogura Iwasaki
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: G11C13/00
- IPC: G11C13/00

Abstract:
Memory array structures providing for determination of resistive characteristics of access lines might include a first block of memory cells, a second block of memory cells, a first current path between a particular access line of the first block of memory cells and a particular access line of the second block of memory cells, and, optionally, a second current path between the particular access line of the second block of memory cells and a different access line of the first block of memory cells. Methods for determining resistive characteristics of access lines might include connecting the particular access line of the first block of memory cells to a driver, and determining the resistive characteristics in response to a current level through that access line and a voltage level of that access line.
Public/Granted literature
- US20210201993A1 MEMORY ARRAY STRUCTURES AND METHODS FOR DETERMINATION OF RESISTIVE CHARACTERISTICS OF ACCESS LINES Public/Granted day:2021-07-01
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