Invention Grant
- Patent Title: Method for producing a metal-ceramic substrate with at least one via
-
Application No.: US17008763Application Date: 2020-09-01
-
Publication No.: US11557490B2Publication Date: 2023-01-17
- Inventor: Alexander Roth
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: EP16001878 20160829
- Main IPC: H01L21/48
- IPC: H01L21/48 ; C04B35/645 ; C04B37/02 ; H05K3/40 ; C04B41/00 ; C04B41/51 ; C04B41/88 ; H01L23/15 ; H01L23/373 ; H01L23/498 ; H05K1/03 ; H05K3/02

Abstract:
A method for producing a metal-ceramic substrate with electrically conductive vias includes: attaching a first metal layer in a planar manner to a first surface side of a ceramic layer; after attaching the first metal layer, introducing a copper hydroxide or copper acetate brine into holes in the ceramic layer delimiting a via, to form an assembly; converting the copper hydroxide or copper acetate brine into copper oxide; subjecting the assembly to a high-temperature step above 500° C. in which the copper oxide forms a copper body in the holes; and after converting the copper hydroxide or copper acetate brine into the copper oxide, attaching a second metal layer in a planar manner to a second surface side of the ceramic layer opposite the first surface side. The copper body produces an electrically conductive connection between the first and the second metal layers.
Information query
IPC分类: