Invention Grant
- Patent Title: Transition metal precursor having low tap density and lithium transition metal oxide having high particle strength
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Application No.: US14441580Application Date: 2014-02-11
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Publication No.: US11577969B2Publication Date: 2023-02-14
- Inventor: Jinhyung Lim , Sung-Kyun Chang , Won Seok Chang , Sin Young Park , Ho Suk Shin , Hyun Jin Oh , Jung Min Han , In Sung Uhm , Wang Mo Jung , Dong Hun Lee
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KR10-2013-0015206 20130213
- International Application: PCT/KR2014/001107 WO 20140211
- International Announcement: WO2014/126373 WO 20140821
- Main IPC: C01G53/04
- IPC: C01G53/04 ; C01G53/00 ; H01M10/0525 ; H01M10/052 ; H01M4/505 ; H01M4/525 ; H01M4/02
Abstract:
Disclosed are a transition metal precursor for preparation of a lithium transition metal oxide, in which a ratio of tap density of the precursor to average particle diameter D50 of the precursor satisfies the condition represented by Equation 1 below, and a lithium transition metal oxide prepared using the same. 0
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