Invention Grant
- Patent Title: Characterization of an electron beam
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Application No.: US17777747Application Date: 2020-11-12
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Publication No.: US11579318B2Publication Date: 2023-02-14
- Inventor: Per Takman , Tomi Tuohimaa , Ulf Lundström
- Applicant: Excillum AB
- Applicant Address: SE Kista
- Assignee: Excillum AB
- Current Assignee: Excillum AB
- Current Assignee Address: SE Kista
- Agency: Buchanan Ingersoll & Rooney P.C.
- Priority: EP19209895 20191119
- International Application: PCT/EP2020/081854 WO 20201112
- International Announcement: WO2021/099202 WO 20210527
- Main IPC: G01T1/34
- IPC: G01T1/34

Abstract:
A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also a corresponding liquid metal jet X-ray source.
Public/Granted literature
- US20220404514A1 CHARACTERIZATION OF AN ELECTRON BEAM Public/Granted day:2022-12-22
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