Invention Grant
- Patent Title: Optical proximity correction method and method of fabricating mask including the same
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Application No.: US16952330Application Date: 2020-11-19
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Publication No.: US11599017B2Publication Date: 2023-03-07
- Inventor: Soo Yong Lee , Seo Rim Moon , Kyung Jae Park , Soo Ryong Lee , Kang-Min Jung
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2020-0047235 20200420
- Main IPC: G03F1/36
- IPC: G03F1/36 ; H01L21/027 ; G03F7/20
Abstract:
An optical proximity correction method includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, forming the first-first patterns at positions where the first patterns are formed, and performing correction on the pattern mask on which the first-first patterns are formed.
Public/Granted literature
- US20210325773A1 OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING MASK INCLUDING THE SAME Public/Granted day:2021-10-21
Information query
