Invention Grant
- Patent Title: Semiconductor device including anti-fuse cell
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Application No.: US16713967Application Date: 2019-12-13
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Publication No.: US11600626B2Publication Date: 2023-03-07
- Inventor: Meng-Sheng Chang , Yao-Jen Yang , Yih Wang , Fu-An Wu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/112
- IPC: H01L27/112 ; G11C7/10 ; H01L23/522 ; G11C17/16 ; H01L23/525 ; G11C5/06 ; G11C8/08 ; G11C17/18

Abstract:
A structure includes anti-fuse cells. The anti-fuse cells include a first active area, a first gate, a second gate, at least one first gate via, and at least one second gate via. The first gate and the second gate are separate from each other. The first gate and the second gate extend to cross over the first active area. The at least one first gate via is coupled to the first gate and disposed directly above the first active area. The at least one second gate via is coupled to the second gate. The first gate is coupled through the at least one first gate via to a first word line for receiving a first programming voltage, and the second gate is coupled through the at least one second gate via to a second word line for receiving a first reading voltage.
Public/Granted literature
- US20210183871A1 SEMICONDUCTOR DEVICE INCLUDING ANTI-FUSE CELL Public/Granted day:2021-06-17
Information query
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