Reduced area efuse cell structure

    公开(公告)号:US10163783B1

    公开(公告)日:2018-12-25

    申请号:US15922439

    申请日:2018-03-15

    摘要: An integrated circuit structure includes a first fuse line formed in a first metal layer; a second fuse line formed in the first metal layer; a first pair of fuse wings formed in the first metal layer on opposite sides of a first end of the first fuse line; a second pair of fuse wings formed in the first metal layer on opposites sides of a first end of the second fuse line; a third pair of fuse wings formed in the first metal layer on opposite sides of a second end of the first fuse line; and a fourth pair of fuse wings formed in the first metal layer on opposites sides of a second end of the second fuse line. The first and second pairs of fuse wings share a first common fuse wing and the third and fourth pairs of wings share a second common fuse wing.

    Semiconductor device including anti-fuse cell

    公开(公告)号:US11600626B2

    公开(公告)日:2023-03-07

    申请号:US16713967

    申请日:2019-12-13

    摘要: A structure includes anti-fuse cells. The anti-fuse cells include a first active area, a first gate, a second gate, at least one first gate via, and at least one second gate via. The first gate and the second gate are separate from each other. The first gate and the second gate extend to cross over the first active area. The at least one first gate via is coupled to the first gate and disposed directly above the first active area. The at least one second gate via is coupled to the second gate. The first gate is coupled through the at least one first gate via to a first word line for receiving a first programming voltage, and the second gate is coupled through the at least one second gate via to a second word line for receiving a first reading voltage.

    LAYOUT STRUCTURE INCLUDING ANTI-FUSE CELL

    公开(公告)号:US20210202503A1

    公开(公告)日:2021-07-01

    申请号:US16729973

    申请日:2019-12-30

    摘要: A structure includes a first data line and a first anti-fuse cell including first/second programming devices and first/second reading devices. The first programming device includes a first gate and first/second source/drain regions disposing on opposite sides of first gate. The second programming device includes a second gate separate from the first gate and coupled to a first word line and third/fourth source/drain regions disposing on opposite sides of second gate. The first reading device includes a third gate and fifth/sixth source/drain regions disposing on opposite sides of third gate. The second reading device includes a fourth gate and seventh/eighth source/drain regions disposing on opposite sides of fourth gate. The third/fourth gates are parts of the first continuous gate coupled to a second word line. The fifth/seventh source/drain regions are coupled to the second/fourth source/drain regions, respectively. The sixth/eighth source/drain regions are coupled to the first data line.

    Integrated circuit including eFuse cell

    公开(公告)号:US11569248B2

    公开(公告)日:2023-01-31

    申请号:US16990995

    申请日:2020-08-11

    IPC分类号: H01L27/112 G11C17/16

    摘要: An integrated circuit is disclosed. The integrated circuit includes a transistor, a first fuse element and a second fuse element. The transistor is formed in a first conductive layer. The first fuse element is formed in a second conductive layer disposed above the first conductive layer. The second fuse element is formed in the second conductive layer and is coupled to the first fuse element. The transistor is coupled through the first fuse element to a first data line for receiving a first data signal, and the transistor is coupled through the second fuse element to a second data line for receiving a second data signal. A method of fabricating an integrated circuit (IC) is also disclosed herein.

    Layout structure including anti-fuse cell

    公开(公告)号:US11257827B2

    公开(公告)日:2022-02-22

    申请号:US16729973

    申请日:2019-12-30

    摘要: A structure includes a first data line and a first anti-fuse cell including first/second programming devices and first/second reading devices. The first programming device includes a first gate and first/second source/drain regions disposing on opposite sides of first gate. The second programming device includes a second gate separate from the first gate and coupled to a first word line and third/fourth source/drain regions disposing on opposite sides of second gate. The first reading device includes a third gate and fifth/sixth source/drain regions disposing on opposite sides of third gate. The second reading device includes a fourth gate and seventh/eighth source/drain regions disposing on opposite sides of fourth gate. The third/fourth gates are parts of the first continuous gate coupled to a second word line. The fifth/seventh source/drain regions are coupled to the second/fourth source/drain regions, respectively. The sixth/eighth source/drain regions are coupled to the first data line.

    Reduced area eFuse cell structure

    公开(公告)号:US10535602B2

    公开(公告)日:2020-01-14

    申请号:US16202708

    申请日:2018-11-28

    摘要: An integrated circuit structure includes a first fuse line formed in a first metal layer; a second fuse line formed in the first metal layer; a first pair of fuse wings formed in the first metal layer on opposite sides of a first end of the first fuse line; a second pair of fuse wings formed in the first metal layer on opposites sides of a first end of the second fuse line; a third pair of fuse wings formed in the first metal layer on opposite sides of a second end of the first fuse line; and a fourth pair of fuse wings formed in the first metal layer on opposites sides of a second end of the second fuse line. The first and second pairs of fuse wings share a first common fuse wing and the third and fourth pairs of wings share a second common fuse wing.

    REDUCED AREA EFUSE CELL STRUCTURE
    8.
    发明申请

    公开(公告)号:US20190287900A1

    公开(公告)日:2019-09-19

    申请号:US16202708

    申请日:2018-11-28

    摘要: An integrated circuit structure includes a first fuse line formed in a first metal layer; a second fuse line formed in the first metal layer; a first pair of fuse wings formed in the first metal layer on opposite sides of a first end of the first fuse line; a second pair of fuse wings formed in the first metal layer on opposites sides of a first end of the second fuse line; a third pair of fuse wings formed in the first metal layer on opposite sides of a second end of the first fuse line; and a fourth pair of fuse wings formed in the first metal layer on opposites sides of a second end of the second fuse line. The first and second pairs of fuse wings share a first common fuse wing and the third and fourth pairs of wings share a second common fuse wing.