Invention Grant
- Patent Title: Substrate inspection apparatus, substrate processing apparatus, substrate inspection method, and computer-readable recording medium
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Application No.: US16804159Application Date: 2020-02-28
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Publication No.: US11609502B2Publication Date: 2023-03-21
- Inventor: Akiko Kiyotomi , Masato Hosaka , Tadashi Nishiyama , Kazuya Hisano
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JPJP2019-038414 20190304,JPJP2019-204944 20191112
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06V10/44 ; H01L21/67 ; G06Q20/08 ; G06Q20/22
Abstract:
A substrate inspection apparatus includes: a storage configured to store inspection image data obtained from a captured image of a periphery of a substrate on which a plurality of films is formed, and an inspection recipe; and an edge detector configured to detect a target edge as an edge of an inspection target film among the films on the basis of the inspection image data stored in the storage by using the inspection recipe stored in the storage. Each of edges of the films extends along the periphery of the substrate. The inspection recipe is configured by combining parameters each of which has one option specified among a plurality of options.
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Information query
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