Invention Grant
- Patent Title: Resistor and resistor-transistor-logic circuit with GaN structure and method of manufacturing the same
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Application No.: US17075707Application Date: 2020-10-21
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Publication No.: US11631664B2Publication Date: 2023-04-18
- Inventor: Kuo-Hsing Lee , Sheng-Yuan Hsueh , Chien-Liang Wu , Te-Wei Yeh , Yi-Chun Chen
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN202010993249.2 20200921
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L29/20 ; H01L29/205 ; H01L29/40 ; H01L29/66 ; H01L29/778 ; H01L49/02 ; H01L21/306 ; H01L21/765 ; H01L21/8252

Abstract:
A resistor-transistor-logic (RTL) circuit with GaN structure, including a GaN layer, a AlGaN barrier layer on the GaN layer, multiple p-type doped GaN capping layers on the AlGaN barrier layer, wherein parts of the p-type doped GaN capping layers in a high-voltage region and in a low-voltage region convert the underlying GaN layer into gate depletion areas, the GaN layer not covered by the p-type doped GaN capping layers in a resistor region becomes a 2DEG resistor.
Public/Granted literature
- US20220093584A1 RESISTOR AND RESISTOR-TRANSISTOR-LOGIC CIRCUIT WITH GAN STRUCTURE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-03-24
Information query
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