- 专利标题： Charged particle beam device
-
申请号： US16641870申请日： 2017-09-04
-
公开(公告)号： US11640897B2公开(公告)日： 2023-05-02
- 发明人: Ryo Hirano , Tsunenori Nomaguchi , Chisato Kamiya , Junichi Katane
- 申请人： Hitachi High-Technologies Corporation
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Crowell & Moring LLP
- 国际申请： PCT/JP2017/031789 WO 20170904
- 国际公布： WO2019/043946 WO 20190307
- 主分类号： H01J37/28
- IPC分类号： H01J37/28 ; H01J37/141 ; H01J37/20 ; H01J37/244
摘要：
The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
公开/授权文献
- US20200251304A1 Charged Particle Beam Device 公开/授权日：2020-08-06
信息查询
