Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US16641870Application Date: 2017-09-04
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Publication No.: US11640897B2Publication Date: 2023-05-02
- Inventor: Ryo Hirano , Tsunenori Nomaguchi , Chisato Kamiya , Junichi Katane
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2017/031789 WO 20170904
- International Announcement: WO2019/043946 WO 20190307
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/141 ; H01J37/20 ; H01J37/244
Abstract:
The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
Public/Granted literature
- US20200251304A1 Charged Particle Beam Device Public/Granted day:2020-08-06
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