Invention Grant
- Patent Title: Height measurement method and height measurement device
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Application No.: US17106638Application Date: 2020-11-30
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Publication No.: US11644304B2Publication Date: 2023-05-09
- Inventor: Masafumi Yamanaka
- Applicant: MITUTOYO CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: MITUTOYO CORPORATION
- Current Assignee: MITUTOYO CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP 2019218545 2019.12.03
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G02B27/00 ; H04N23/55 ; H04N23/67

Abstract:
A height measurement device includes: a lens system; a lens controller to output a drive signal to the lens system; a continuous illuminator to continuously illuminate a workpiece; an image detector to detect an image of the workpiece; an image calculation unit to calculate an EDOF image on a basis of a detected image; a focal depth adjustment unit to cause an extended focal depth of the EDOF image to be increased or decreased by increasing or decreasing an amplitude of the drive signal; a focus determination unit to determine a focus state of a portion of interest of the workpiece included in the EDOF image; and a height measurement unit to measure an upper limit or a lower limit of the extended focal depth, the upper limit or the lower limit being based on a timing at which the focus state of the portion of interest has changed.
Public/Granted literature
- US20210164768A1 HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT DEVICE Public/Granted day:2021-06-03
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