- Patent Title: Recessed semiconductor devices, and associated systems and methods
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Application No.: US17243411Application Date: 2021-04-28
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Publication No.: US11646269B2Publication Date: 2023-05-09
- Inventor: Andrew M. Bayless , Brandon P. Wirz
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L25/065 ; H01L21/768 ; H01L23/532

Abstract:
Semiconductor devices having recessed edges with plated structures, semiconductor assemblies formed therefrom, and associated systems and methods are disclosed herein. In one embodiment, a semiconductor assembly includes a first semiconductor device and a second semiconductor device. The first semiconductor device can include an upper surface and a first dielectric layer over the upper surface, the second semiconductor device can include a lower surface and a second dielectric layer over the lower surface, and the first and second dielectric layers can be bonded to couple the first and second semiconductor devices. The first and second dielectric layers can each include a plurality of inwardly extending recesses exposing a plurality of metal structures on the respective upper and lower surfaces, and the upper surface recesses and metal structures can correspond to the lower surface recesses and metal structures. The metal structures can be electrically coupled by plated structures positioned in the recesses.
Public/Granted literature
- US20220352077A1 RECESSED SEMICONDUCTOR DEVICES, AND ASSOCIATED SYSTEMS AND METHODS Public/Granted day:2022-11-03
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