Invention Grant
- Patent Title: Systems and methods for etching of metals
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Application No.: US16896554Application Date: 2020-06-09
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Publication No.: US11647590B2Publication Date: 2023-05-09
- Inventor: Jeffrey P. Burress , Richard D. Neufeld , Surjit Singh Dhesi
- Applicant: D-WAVE SYSTEMS INC.
- Applicant Address: CA Burnaby
- Assignee: D-WAVE SYSTEMS INC.
- Current Assignee: D-WAVE SYSTEMS INC.
- Current Assignee Address: CA Burnaby
- Agency: Cozen O'Connor
- Main IPC: H05K3/06
- IPC: H05K3/06 ; H01L39/24

Abstract:
A method of fabricating a multilayer superconducting printed circuit board comprises first, forming a bimetal foil to overlie a substrate, the bimetal foil comprising a first layer of a first metal, a layer of a second metal, and a second layer of the first metal, and then etching the second layer of the first metal. Forming a bimetal foil to overlie a substrate may include forming a bimetal foil comprising a first layer of a normal metal, a layer of a superconducting metal, and a second layer of the normal metal. Etching the second layer of the first metal may include preparing a patterned image in the second layer of the first metal for etching, processing the patterned image through a cleaner, rinsing the patterned image, and then, immersing the patterned image in a microetch.
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