Invention Grant
- Patent Title: Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device
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Application No.: US16994957Application Date: 2020-08-17
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Publication No.: US11662662B2Publication Date: 2023-05-30
- Inventor: Hyunji Song , Sukkoo Hong , Sumin Kim , Yechan Kim , Juyoung Kim , Jinjoo Kim , Hyunwoo Kim , Juhyeon Park , Songse Yi
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR 20200007385 2020.01.20
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C07D213/68 ; C07D263/32 ; C07D233/64 ; C07D277/26
Abstract:
A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:
wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
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