Disclosed herein are techniques for molding a slanted structure. In some embodiments, a mold for nanoimprint lithography includes a support layer, a polymeric layer on the support layer and including a slanted structure, and an oxide layer on surfaces of the slanted structure. In some embodiments, the oxide layer is conformally deposited on the surfaces of the slanted structure by atomic layer deposition. In some embodiments, the mold further includes an anti-sticking layer on the oxide layer.