Invention Grant
- Patent Title: Spatial optical emission spectroscopy for etch uniformity
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Application No.: US17234940Application Date: 2021-04-20
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Publication No.: US11668602B2Publication Date: 2023-06-06
- Inventor: Blake Erickson , Keith Berding , Michael Kutney , Zhaozhao Zhu , Tsung Feng Wu , Michael D. Willwerth , Jeffrey Ludwig
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: G01J3/32
- IPC: G01J3/32 ; G01J3/02 ; G01N21/25 ; G01N21/68 ; G01N21/95

Abstract:
An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.
Public/Granted literature
- US20220333989A1 SPATIAL OPTICAL EMISSION SPECTROSCOPY FOR ETCH UNIFORMITY Public/Granted day:2022-10-20
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