Invention Grant
- Patent Title: Methods and apparatus for microwave leakage reduction for semiconductor process chambers
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Application No.: US16363537Application Date: 2019-03-25
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Publication No.: US11670525B2Publication Date: 2023-06-06
- Inventor: Preetham P. Rao , Ananthkrishna Jupudi , Ribhu Gautam
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H05B6/76 ; H05B6/64

Abstract:
Methods and apparatus for reducing leakage of microwaves at a slit valve of a process chamber. A multi-frequency resonant choke around the slit valve prevents microwave energy from a band of frequencies from escaping from the slit valve. The multi-frequency resonant choke may have a sloping bottom surface or a serrated bottom surface to enable multiple frequencies to resonant in the choke, canceling a range of microwave frequencies at gaps formed by a slit valve gate.
Public/Granted literature
- US20190326141A1 METHODS AND APPARATUS FOR MICROWAVE LEAKAGE REDUCTION FOR SEMICONDUCTOR PROCESS CHAMBERS Public/Granted day:2019-10-24
Information query
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