Invention Grant
- Patent Title: Semiconductor devices comprising threshold switching materials
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Application No.: US17162071Application Date: 2021-01-29
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Publication No.: US11672191B2Publication Date: 2023-06-06
- Inventor: Tsz W. Chan , D. V. Nirmal Ramaswamy , Qian Tao , Yongjun J. Hu , Everett A. McTeer
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- The original application number of the division: US15642673 2017.07.06
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A memory cell comprising a threshold switching material over a first electrode on a substrate. The memory cell includes a second electrode over the threshold switching material and at least one dielectric material between the threshold switching material and at least one of the first electrode and the second electrode. A memory material overlies the second electrode. The dielectric material may directly contact the threshold switching material and each of the first electrode and the second electrode. Memory cells including only one dielectric material between the threshold switching material and an electrode are disclosed. A memory device including the memory cells and methods of forming the memory cells are also described.
Public/Granted literature
- US20210151676A1 SEMICONDUCTOR DEVICES COMPRISING THRESHOLD SWITCHING MATERIALS Public/Granted day:2021-05-20
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