Invention Grant
- Patent Title: Gallium oxide crystal manufacturing device
-
Application No.: US17183753Application Date: 2021-02-24
-
Publication No.: US11674239B2Publication Date: 2023-06-13
- Inventor: Keigo Hoshikawa , Takumi Kobayashi , Yoshio Otsuka , Toshinori Taishi
- Applicant: Fujikoshi Machinery Corp. , SHINSHU UNIVERSITY , Novel Crystal Technology, Inc.
- Applicant Address: JP Nagano
- Assignee: Fujikoshi Machinery Corp.,Shinshu University,Novel Crystal Technology, Inc.
- Current Assignee: Fujikoshi Machinery Corp.,Shinshu University,Novel Crystal Technology, Inc.
- Current Assignee Address: JP Nagano; JP Nagano; JP Saitama
- Agency: Scully, Scott, Murphy & Presser, PC
- Priority: JP 2020032482 2020.02.27
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C30B11/00

Abstract:
A gallium oxide crystal manufacturing device includes a crucible to hold a gallium oxide source material therein, a crucible support that supports the crucible from below, a crucible support shaft that is connected to the crucible support from below and vertically movably supports the crucible and the crucible support, a tubular furnace core tube that surrounds the crucible, the crucible support and the crucible support shaft, a tubular furnace inner tube that surrounds the furnace core tube, and a resistive heating element including a heat-generating portion placed in a space between the furnace core tube and the furnace inner tube. Melting points of the furnace core tube and the furnace inner tube are not less than 1900° C. A thermal conductivity of a portion of the furnace core tube located directly next to the crucible in a radial direction thereof is higher than a thermal conductivity of the furnace inner tube.
Public/Granted literature
- US20210269941A1 GALLIUM OXIDE CRYSTAL MANUFACTURING DEVICE Public/Granted day:2021-09-02
Information query
IPC分类: