- 专利标题： Resist composition and method for producing resist pattern
-
申请号： US17175907申请日： 2021-02-15
-
公开(公告)号： US11681220B2公开(公告)日： 2023-06-20
- 发明人: Yukako Anryu , Satoshi Yamaguchi , Koji Ichikawa
- 申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Buchanan, Ingersoll & Rooney PC
- 优先权： JP 2020037661 2020.03.05
- 主分类号： G03F7/04
- IPC分类号： G03F7/04 ; C07C25/00 ; C07C63/70 ; G03F7/004 ; C08F212/14 ; C08F220/28 ; C08F220/16 ; C07C25/02 ; C07C25/13 ; C07C63/68 ; C07C63/00 ; C07C63/10
摘要：
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator:
wherein, in formula (I),
R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
wherein, in formula (I),
R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
公开/授权文献
信息查询
IPC分类:
