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公开(公告)号：US12105419B2
公开(公告)日：2024-10-01
申请号：US16874079
申请日：2020-05-14
发明人： Katsuhiro Komuro , Yuki Takahashi , Koji Ichikawa
IPC分类号： G03F7/004 , C07D327/08 , C07D339/08 , G03F7/038 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , C07D327/08 , C07D339/08 , G03F7/038 , G03F7/039 , G03F7/162 , G03F7/20 , G03F7/30 , G03F7/38
摘要： Disclosed are a salt represented by formula (I) and a resist composition including the same:
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公开(公告)号：US11500288B2
公开(公告)日：2022-11-15
申请号：US16741901
申请日：2020-01-14
发明人： Mutsuko Higo , Shingo Fujita , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/038 , C08F220/18 , C08F220/28 , C08F212/14 , C08F220/38 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38
摘要： Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
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公开(公告)号：US11474431B2
公开(公告)日：2022-10-18
申请号：US16014836
申请日：2018-06-21
摘要： A compound represented by the formula (I):
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公开(公告)号：US11467490B2
公开(公告)日：2022-10-11
申请号：US17166303
申请日：2021-02-03
发明人： Tatsuro Masuyama , Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , C08F212/14 , C08F220/18 , C07C309/06 , C07C309/17 , C07C381/12 , C07D307/00 , C07D321/10 , C07D327/04
摘要： Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.
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公开(公告)号：US10816902B2
公开(公告)日：2020-10-27
申请号：US16026588
申请日：2018-07-03
摘要： A salt represented by the formula (I). wherein Q1, Q2, R1, R2, R3, R4, R5, z, and Z+ are defined in the specification.
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公开(公告)号：US10795258B2
公开(公告)日：2020-10-06
申请号：US15191797
申请日：2016-06-24
发明人： Takayuki Miyagawa , Shingo Fujita , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C08F214/18 , C08F216/10 , C08F220/24 , C08F220/28 , C08F220/38 , C08F220/68 , C08F222/18 , C08F222/20 , C08F222/24 , G03F7/039 , G03F7/20
摘要： A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.
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公开(公告)号：US10774029B2
公开(公告)日：2020-09-15
申请号：US16138275
申请日：2018-09-21
IPC分类号： C07C69/653 , C07C69/74 , G03F7/004 , G03F7/38 , C08F122/10 , G03F7/32 , C08F122/18 , C08F214/18 , C07C69/757 , C07C69/533 , C07C69/54 , G03F7/039 , C08F218/00
摘要： A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *-A3-X1-(A4-X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O— or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
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8.发明授权公开(公告)号：US10359700B2
公开(公告)日：2019-07-23
申请号：US14714812
申请日：2015-05-18
发明人： Yukako Anryu , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20 , G03F7/32 , G03F7/38 , C07C309/17 , C07D411/06 , C07D295/26 , C07D339/08 , C07D321/00 , C07D417/06 , C07D307/33 , C07D321/10 , C07D319/08 , C07D327/06
摘要： A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom or a carbonyl group, a C3-C12 cycloalkyl group which can have a fluorine atom, or a C6-C12 aromatic hydrocarbon group which can have a fluorine atom; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C4-C36 heteroaromatic hydrocarbon group which can have a substituent; R1 and R2 each independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; “m” and “n” each independently represent 1 or 2; R3 and R4 each independently represent a hydrogen atom or a C1-C12 hydrocarbon group, R3 and R4 may be bonded to form a ring, or R3 or R4 may form a ring together with Ar; and A− represents an organic anion which has an acid-labile group, an organic anion which has a base-labile group, or an organic anion which has an acid-labile group and a base-labile group.
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公开(公告)号：US20190107778A1
公开(公告)日：2019-04-11
申请号：US16149530
申请日：2018-10-02
发明人： Katsuhiro Komuro , Yuki Takahashi , Koji Ichikawa
摘要： A salt represented by the formula (I):
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公开(公告)号：US10047046B2
公开(公告)日：2018-08-14
申请号：US15443575
申请日：2017-02-27
发明人： Tatsuro Masuyama , Natsuki Okada , Koji Ichikawa
IPC分类号： G03F7/004 , C07C381/12 , G03F7/32 , G03F7/039 , H01L21/027 , C07D327/06 , C07D493/10 , C07D493/20 , C08F20/18 , C08F20/24 , C08F20/28 , G03F7/038 , G03F7/09 , G03F7/16 , G03F7/20 , G03F7/38 , C07D495/10 , C07D495/20
摘要： A salt having a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocyclic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.
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