Invention Grant
- Patent Title: Substrate including a self-supporting tri-layer stack
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Application No.: US15733110Application Date: 2018-11-19
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Publication No.: US11683977B2Publication Date: 2023-06-20
- Inventor: Stephen A. Johnson , Derek W. Patzman , Richard Y. Liu , John F. Van Derlofske, III , Kristopher J. Derks , Victor Ho , Kevin T. Huseby
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN St. Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN St. Paul
- Agent Clifton F. Richardson
- International Application: PCT/US2018/061731 2018.11.19
- International Announcement: WO2019/108423A 2019.06.06
- Date entered country: 2020-05-19
- Main IPC: H10K77/10
- IPC: H10K77/10 ; B32B27/36 ; G06F3/041 ; B32B27/08 ; H10K50/00 ; B32B7/023

Abstract:
A substrate including a self-supporting tri-layer stack is described. The tri-layer stack includes first and second outer layers and a biaxially oriented layer disposed between and in direct contact with the first and second outer layers. The biaxially oriented layer may include a first polyester having greater than 45 mole percent naphthalate units and greater than 45 mole percent ethylene units. Each of the first and second outer layers includes a second polyester which may include 40 to 50 mole percent naphthalate units, at least 25 mole percent ethylene units, and 10 to 25 mole percent of branched or cyclic C4-C10 alkyl units.
Public/Granted literature
- US20200348780A1 SUBSTRATE INCLUDING A SELF-SUPPORTING TRI-LAYER STACK Public/Granted day:2020-11-05
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