Invention Grant
- Patent Title: Method and system for reducing migration errors
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Application No.: US17365468Application Date: 2021-07-01
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Publication No.: US11699010B2Publication Date: 2023-07-11
- Inventor: Sandeep Kumar Goel , Ankita Patidar , Yun-Han Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. , TSMC NANJING COMPANY, LIMITED
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,TSMC NANJING COMPANY, LIMITED
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,TSMC NANJING COMPANY, LIMITED
- Current Assignee Address: TW Hsinchu; CN Nanjing
- Agency: Hauptman Ham, LLP
- Priority: CN 1911315931.X 2019.12.19
- Main IPC: G06F30/323
- IPC: G06F30/323 ; G06F30/3323 ; G06F30/392 ; G06F30/394 ; G03F1/70 ; G06F119/12

Abstract:
A method of manufacturing a semiconductor device includes reducing errors in a migration of a first netlist to a second netlist, the first netlist corresponding to a first semiconductor process technology (SPT), the second first netlist corresponding to a second SPT, the first and second netlists each representing a same circuit design, the reducing errors including: inspecting a timing constraint list corresponding to the second netlist for addition candidates; generating a first version of the second netlist having a first number of comparison points relative to a logic equivalence check (LEC) context, the first number of comparison points being based on the addition candidates; performing a LEC between the first netlist and the first version of the second netlist, thereby identifying migration errors; and revising the second netlist to reduce the migration errors, thereby resulting in a second version of the second netlist.
Public/Granted literature
- US20210326502A1 METHOD AND SYSTEM FOR REDUCING MIGRATION ERRORS Public/Granted day:2021-10-21
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