- 专利标题: Resonator and method for manufacturing the same
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申请号: US16993198申请日: 2020-08-13
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公开(公告)号: US11699988B2公开(公告)日: 2023-07-11
- 发明人: Shiyang Cheng , Ke Wu , Yang Li , Chao Wang
- 申请人: AAC ACOUSTIC TECHNOLOGIES (SHENZHEN) CO., LTD.
- 申请人地址: CN Shenzhen
- 专利权人: AAC Acoustic Technologies (Shenzhen) Co., Ltd.
- 当前专利权人: AAC Acoustic Technologies (Shenzhen) Co., Ltd.
- 当前专利权人地址: CN Shenzhen
- 代理机构: W&G Law Group
- 主分类号: H03H9/17
- IPC分类号: H03H9/17 ; H03H3/02 ; H03H9/13
摘要:
A resonator includes a silicon substrate, a bottom electrode stacked on a portion of the silicon substrate, a piezoelectric layer covering the bottom electrode and another portion of the silicon substrate, a top electrode stacked on the piezoelectric layer, and a Bragg reflecting ring. The Bragg reflecting ring is formed on a side of the piezoelectric layer connected to the top electrode and surrounds the top electrode. The Bragg reflecting ring includes a Bragg high-resistivity layer and a Bragg low-resistivity layer alternately arranged along the radial direction of the Bragg reflecting ring. An acoustic impedance of the Bragg high-resistivity layer is greater than an acoustic impedance of the Bragg low-resistivity layer. The Bragg reflecting ring forms reflection surfaces to reflect the laterally propagating clutter waves, thereby suppressing the parasitic mode in the working frequency band, improving the frequency response curve of the resonator and the overall performance of the resonator.
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