Invention Grant
- Patent Title: Particle prevention method in reticle pod
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Application No.: US17004998Application Date: 2020-08-27
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Publication No.: US11703754B2Publication Date: 2023-07-18
- Inventor: Tzu Han Liu , Chih-Wei Wen , Chung-Hung Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT Law
- Agent Anthony King
- Main IPC: G03F1/66
- IPC: G03F1/66 ; H01L21/673

Abstract:
A reticle pod is provided. The reticle pod includes a container and a fluid regulating module mounted to the container. The fluid regulating module includes a first cap, a second cap and a sealing film. The first cap and the second cap are connected to each other. A flowing path is formed between the first cap and the second cap for allowing a fluid passing through the fluid regulating module. The sealing film is positioned between the first cap and the second cap and configured for regulating a flow of the fluid passing through the flowing path.
Public/Granted literature
- US20210356857A1 PARTICLE PREVENTION METHOD IN RETICLE POD Public/Granted day:2021-11-18
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