公开(公告)号：US11340524B2

公开(公告)日：2022-05-24

申请号：US16794912

申请日：2020-02-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: C09J7/30 ,  C09J201/08 ,  B32B27/40 ,  G03F1/24 ,  G03F1/48 ,  G03F1/60 ,  B32B27/30

Abstract: The present disclosure provides a photomask, including a front side having a patterned layer, a back side opposite to the front side, a sidewall connecting the front side and the back side, a reflective layer between the front side and the back side, and a polymer layer on the backside of the photomask.

公开(公告)号：US10775694B1

公开(公告)日：2020-09-15

申请号：US16399046

申请日：2019-04-30

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G03B27/64 ,  G03F1/64 ,  G03F1/38

Abstract: The present disclosure provides an apparatus for mounting a pellicle to a photomask, including a cover having a first side and a second side opposite to the first side, wherein the second side is configured to face the photomask, and an air pad disposed between the first side and the second side, wherein the air pad comprises a compartment filled with air.

公开(公告)号：US11822231B2

公开(公告)日：2023-11-21

申请号：US17373695

申请日：2021-07-12

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G03F1/64 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F7/70025 ,  G03F7/70916 ,  G03F7/70983

Abstract: A method for removing particles includes receiving a pellicle including a pellicle membrane, a pellicle frame and at least a particle disposed on the pellicle membrane, generating light beams to form an optical trap extending in a direction perpendicular to the pellicle membrane, and removing the particle from the pellicle membrane by the optical trap.

公开(公告)号：US11294275B2

公开(公告)日：2022-04-05

申请号：US17019238

申请日：2020-09-12

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G03F1/64 ,  G03F1/38

Abstract: The present disclosure provides an apparatus for mounting a pellicle to a photomask, including a presser, a pellicle stage facing the presser, and a flexible material layer between the presser and the pellicle stage, wherein the flexible material layer includes a compartment filled with gas.

公开(公告)号：US11239001B2

公开(公告)日：2022-02-01

申请号：US16144540

申请日：2018-09-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G21K1/00 ,  H05G2/00

Abstract: A method for generating extreme ultraviolet (EUV) radiation includes introducing a fuel droplet; applying a first laser beam to strike the fuel droplet at a location to generate EUV radiation and form a movable debris of the fuel droplet; and forming an energy field proximal to the location of the first laser beam strike to trap the movable debris. An EUV radiation source includes a fuel droplet generator, a first laser, a collector and an energy field. The fuel droplet generator is configured to provide a fuel droplet. The first laser is configured to generate a first laser beam to strike the fuel droplet at a location to generate EUV radiation and form a movable debris. The collector is configured to reflect the EUV radiation. The energy field is configured to trap the movable debris, wherein the energy field is proximal to the location of the first laser beam strike.

公开(公告)号：US12189283B2

公开(公告)日：2025-01-07

申请号：US17818392

申请日：2022-08-09

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G03F1/66 ,  H01L21/673

Abstract: A method is provided. The method includes detaching an upper shell of a reticle pod from a base. The method further includes while the upper shell is detached from the base, blocking an inlet flow of gas from entering an interior of the reticle pod between the upper shell and the base with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film. The method also includes removing a reticle positioned on the base to a process tool. In addition, the method includes performing a lithography operation in the process tool with the use of the reticle.

公开(公告)号：US20240393679A1

公开(公告)日：2024-11-28

申请号：US18788332

申请日：2024-07-30

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Kun-Lung Hsieh ,  Tzu Han Liu ,  Hao-En Luo ,  Chih-Wei Wen

IPC: G03F1/82 ,  G03F1/64

Abstract: In pellicle cleaning, a gas is flowed on a pellicle using at least one gas nozzle. During the flowing, the pellicle is moved respective to the at least one gas nozzle. During the flowing, the pellicle is exposed to ionized gas generated by at least one alpha ionizer. Also during the flowing, an ultrasonic wave is applied to the pellicle using an ultrasound transducer or transducer array. The gas nozzle may have a nozzle aperture comprising a slit or a linear array of apertures arranged parallel with a pellicle membrane of the pellicle.

公开(公告)号：US11703754B2

公开(公告)日：2023-07-18

申请号：US17004998

申请日：2020-08-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： Tzu Han Liu ,  Chih-Wei Wen ,  Chung-Hung Lin

IPC: G03F1/66 ,  H01L21/673

CPC classification number: G03F1/66 ,  H01L21/67359 ,  H01L21/67376 ,  H01L21/67386

Abstract: A reticle pod is provided. The reticle pod includes a container and a fluid regulating module mounted to the container. The fluid regulating module includes a first cap, a second cap and a sealing film. The first cap and the second cap are connected to each other. A flowing path is formed between the first cap and the second cap for allowing a fluid passing through the fluid regulating module. The sealing film is positioned between the first cap and the second cap and configured for regulating a flow of the fluid passing through the flowing path.