Invention Grant
- Patent Title: Vias for package substrates
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Application No.: US16437420Application Date: 2019-06-11
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Publication No.: US11705389B2Publication Date: 2023-07-18
- Inventor: Andrew J. Brown , Luke Garner , Liwei Cheng , Lauren Link , Cheng Xu , Ying Wang , Bin Zou , Chong Zhang
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L23/498 ; H01L21/48

Abstract:
Embodiments herein describe techniques for a semiconductor device including a package substrate. The package substrate includes a via pad at least partially in a core layer. A first dielectric layer having a first dielectric material is above the via pad and the core layer, where the first dielectric layer has a first through hole that is through the first dielectric layer to reach the via pad. A second dielectric layer having a second dielectric material is at least partially filling the first through hole, where the second dielectric layer has a second through hole that is through the second dielectric layer to reach the via pad. A via is further within the second through hole of the second dielectric layer, surrounded by the second dielectric material, and in contact with the via pad. Other embodiments may be described and/or claimed.
Information query
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