Invention Grant
- Patent Title: Metal mask base, metal mask and method for producing metal mask
-
Application No.: US17100769Application Date: 2020-11-20
-
Publication No.: US11706968B2Publication Date: 2023-07-18
- Inventor: Daisei Fujito , Kiyoaki Nishitsuji , Takehiro Nishi
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Squire Patton Boggs (US) LLP
- Priority: JP 15143509 2015.07.17
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23F1/02 ; C23C14/04 ; H05B33/10 ; B05C21/00 ; C23F1/16 ; H10K71/16 ; H10K71/00
Abstract:
A metal mask substrate includes a metal obverse surface configured such that a resist is placed on the obverse surface. The obverse surface has a three-dimensional surface roughness Sa of less than or equal to 0.11 μm. The obverse surface also has a three-dimensional surface roughness Sz of less than or equal to 3.17 μm.
Public/Granted literature
- US20210091312A1 METAL MASK BASE, METAL MASK AND METHOD FOR PRODUCING METAL MASK Public/Granted day:2021-03-25
Information query
IPC分类:
