Invention Grant
- Patent Title: Method and apparatus for detecting abnormality of manufacturing facility
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Application No.: US17136654Application Date: 2020-12-29
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Publication No.: US11709474B2Publication Date: 2023-07-25
- Inventor: Hyun Chui Kang , Ho Jin Park , Ji Yeon Son , Eun Seo Lee
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: KR 20200013089 2020.02.04
- Main IPC: G06N20/00
- IPC: G06N20/00 ; G06F18/214 ; G05B19/4063 ; G05B19/418

Abstract:
A method and apparatus for detecting an abnormality of a manufacturing facility is disclosed. According to an example embodiment of the present disclosure, a learning model generating method for manufacturing facility abnormality detection may include receiving a measured value for a normal state of a manufacturing facility collected through a multi-sensor on a time-by-time basis, generating a learning model including a predetermined weight set and training the learning model using the measured value, and determining, using the learning model, a threshold corresponding to a boundary between the normal state and an abnormal state of the manufacturing facility and a criterion for determining the abnormal state in a local window representing a predetermined time interval.
Public/Granted literature
- US20210240167A1 METHOD AND APPARATUS FOR DETECTING ABNORMALITY OF MANUFACTURING FACILITY Public/Granted day:2021-08-05
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