公开(公告)号：US11709474B2

公开(公告)日：2023-07-25

申请号：US17136654

申请日：2020-12-29

Applicant: Electronics and Telecommunications Research Institute

Inventor： Hyun Chui Kang ,  Ho Jin Park ,  Ji Yeon Son ,  Eun Seo Lee

IPC: G06N20/00 ,  G06F18/214 ,  G05B19/4063 ,  G05B19/418

CPC classification number: G05B19/4063 ,  G05B19/4183 ,  G05B19/4184 ,  G05B19/4185 ,  G05B19/41865 ,  G06F18/214 ,  G06N20/00

Abstract: A method and apparatus for detecting an abnormality of a manufacturing facility is disclosed. According to an example embodiment of the present disclosure, a learning model generating method for manufacturing facility abnormality detection may include receiving a measured value for a normal state of a manufacturing facility collected through a multi-sensor on a time-by-time basis, generating a learning model including a predetermined weight set and training the learning model using the measured value, and determining, using the learning model, a threshold corresponding to a boundary between the normal state and an abnormal state of the manufacturing facility and a criterion for determining the abnormal state in a local window representing a predetermined time interval.