Invention Grant
- Patent Title: Integrated ultralong time constant time measurement device and fabrication process
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Application No.: US17159698Application Date: 2021-01-27
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Publication No.: US11721646B2Publication Date: 2023-08-08
- Inventor: Abderrezak Marzaki , Pascal Fornara
- Applicant: STMicroelectronics (Rousset) SAS
- Applicant Address: FR Rousset
- Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee Address: FR Rousset
- Agency: Crowe & Dunlevy
- Priority: FR 57842 2018.08.31
- The original application number of the division: US16549000 2019.08.23
- Main IPC: H01L27/10
- IPC: H01L27/10 ; H01L23/00 ; G04F1/00 ; H01L21/70 ; H01L27/01

Abstract:
An ultralong time constant time measurement device includes elementary capacitive elements that are connected in series. Each elementary capacitive element is formed by a stack of a first conductive region, a dielectric layer having a thickness suited for allowing charge to flow by direct tunnelling effect, and a second conductive region. The first conductive region is housed in a trench extending from a front face of a semiconductor substrate down into the semiconductor substrate. The dielectric layer rests on the first face of the semiconductor substrate and in particular on a portion of the first conductive region in the trench. The second conductive region rests on the dielectric layer.
Public/Granted literature
- US20210151392A1 INTEGRATED ULTRALONG TIME CONSTANT TIME MEASUREMENT DEVICE AND FABRICATION PROCESS Public/Granted day:2021-05-20
Information query
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