Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US17295978Application Date: 2018-11-30
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Publication No.: US11735394B2Publication Date: 2023-08-22
- Inventor: Takafumi Miwa , Seiichiro Kanno , Go Miya
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- International Application: PCT/JP2018/044109 2018.11.30
- International Announcement: WO2020/110276A 2020.06.04
- Date entered country: 2021-05-21
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/20 ; H01J37/22 ; H01J37/26

Abstract:
Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.
Public/Granted literature
- US20220028650A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2022-01-27
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