公开(公告)号：US20200371050A1

公开(公告)日：2020-11-26

申请号：US16965228

申请日：2018-02-01

Applicant: Hitachi High-Tech Corporation

Inventor： Tomihiro Hashizume ,  Masatoshi Yasutake ,  Tsunenori Nomaguchi ,  Takafumi Miwa

IPC: G01N23/2252

Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured. Further, by attaching a fine particle spreading tank equipped with a fine particle suspension dropping device inside the microscope body, automatic measurement including dropping of fine particle suspension onto a surface of a surface-modified substrate is possible.

公开(公告)号：US11749494B2

公开(公告)日：2023-09-05

申请号：US17545936

申请日：2021-12-08

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Yohei Nakamura ,  Natsuki Tsuno ,  Heita Kimizuka ,  Muneyuki Fukuda

IPC: H01J37/22 ,  H01J37/244 ,  G01N23/2251

CPC classification number: H01J37/22 ,  G01N23/2251 ,  H01J37/244 ,  G01N2223/07 ,  G01N2223/507 ,  G01N2223/646 ,  H01J2237/2448 ,  H01J2237/2482

Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.

公开(公告)号：US11646172B2

公开(公告)日：2023-05-09

申请号：US17545944

申请日：2021-12-08

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Yohei Nakamura ,  Natsuki Tsuno ,  Heita Kimizuka ,  Muneyuki Fukuda

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/24 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24475 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.

公开(公告)号：US20210043412A1

公开(公告)日：2021-02-11

申请号：US16927932

申请日：2020-07-13

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Yohei Nakamura ,  Natsuki Tsuno ,  Heita Kimizuka ,  Muneyuki Fukuda

IPC: H01J37/22 ,  H01J37/244 ,  G01N23/2251

Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.

公开(公告)号：US20220102109A1

公开(公告)日：2022-03-31

申请号：US17545944

申请日：2021-12-08

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Yohei Nakamura ,  Natsuki Tsuno ,  Heita Kimizuka ,  Muneyuki Fukuda

IPC: H01J37/24 ,  H01J37/244

Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.

公开(公告)号：US20220028650A1

公开(公告)日：2022-01-27

申请号：US17295978

申请日：2018-11-30

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Seiichiro Kanno ,  Go Miya

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/22 ,  H01J37/20

Abstract: Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.

公开(公告)号：US11143606B2

公开(公告)日：2021-10-12

申请号：US16965228

申请日：2018-02-01

Applicant: Hitachi High-Tech Corporation

Inventor： Tomihiro Hashizume ,  Masatoshi Yasutake ,  Tsunenori Nomaguchi ,  Takafumi Miwa

IPC: G01N23/2252 ,  G01N23/2208 ,  G01N21/95 ,  G01N15/02 ,  G01N15/10 ,  G01N23/2251

Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured. Further, by attaching a fine particle spreading tank equipped with a fine particle suspension dropping device inside the microscope body, automatic measurement including dropping of fine particle suspension onto a surface of a surface-modified substrate is possible.

公开(公告)号：US20210043415A1

公开(公告)日：2021-02-11

申请号：US16920898

申请日：2020-07-06

Applicant: Hitachi High-Tech Corporation

Inventor： Yohei Nakamura ,  Takafumi Miwa ,  Heita Kimizuka ,  Natsuki Tsuno ,  Muneyuki Fukuda

IPC: H01J37/244 ,  H01J37/28 ,  G01N23/2251

Abstract: Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects electrons emitted from the sample in response to irradiation of the electron beam by the electron beam optical system. The calculator calculates a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points.

公开(公告)号：US20210043413A1

公开(公告)日：2021-02-11

申请号：US16928931

申请日：2020-07-14

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Yohei Nakamura ,  Natsuki Tsuno ,  Heita Kimizuka ,  Muneyuki Fukuda

IPC: H01J37/24 ,  H01J37/244

Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.

公开(公告)号：US12106930B2

公开(公告)日：2024-10-01

申请号：US17778599

申请日：2019-12-23

Applicant: Hitachi High-Tech Corporation

Inventor： Takafumi Miwa ,  Go Miya ,  Kazuma Tanii ,  Seiichiro Kanno

IPC: H01J37/12 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/022

Abstract: Provided is a charged particle beam device capable of reducing scattering of a foreign substance collected by a foreign substance collecting unit. The charged particle beam device includes: a sample chamber in which a sample is to be disposed; and a charged particle beam source configured to irradiate the sample with a charged particle beam. The charged particle beam device further includes: a foreign substance attachment/detachment unit from or to which a foreign substance is to detach or attach; and a foreign substance collecting unit provided in the sample chamber and configured to collect a foreign substance dropped from the foreign substance attachment/detachment unit. An opening through which the foreign substance passes is provided in an upper end portion of the foreign substance collecting unit. An area of the opening is smaller than a horizontal cross-sectional area of an internal space of the foreign substance collecting unit.