Invention Grant
- Patent Title: Cleaning method and processing apparatus
-
Application No.: US17973876Application Date: 2022-10-26
-
Publication No.: US11745231B2Publication Date: 2023-09-05
- Inventor: Masami Oikawa , Tomoya Hasegawa , Koji Sasaki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP 20144871 2020.08.28
- The original application number of the division: US17411372 2021.08.25
- Main IPC: B08B9/093
- IPC: B08B9/093 ; B08B13/00

Abstract:
A cleaning method includes: supplying a cleaning gas in a processing container while continuously increasing a pressure in the processing container in a stepwise manner at a plurality of time points, thereby executing a cleaning of the processing container by removing a film deposited in the processing container; and detecting an end point of the cleaning based on time-dependent data of a concentration of a predetermined gas generated during the executing the cleaning, for each pressure of the plurality of time points. The executing the cleaning is implemented when the time-dependent data of the concentration of the predetermined gas generated in the continuously increasing the pressure changes from an increasing state to a decreasing state after exceeding a threshold value.
Public/Granted literature
- US20230047426A1 CLEANING METHOD AND PROCESSING APPARATUS Public/Granted day:2023-02-16
Information query
IPC分类: