Invention Grant
- Patent Title: Layout design methodology for stacked devices
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Application No.: US17572296Application Date: 2022-01-10
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Publication No.: US11756951B2Publication Date: 2023-09-12
- Inventor: Fong-yuan Chang , Po-Hsiang Huang , Chin-Chou Liu , Chin-Her Chien , Ka Fai Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- The original application number of the division: US16530631 2019.08.02
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L27/02 ; H01L27/06 ; G11C8/18 ; H01L23/48

Abstract:
A layout design methodology is provided for a device that includes two or more identical structures. Each device can have a first die, a second die stacked over the first die and a third die stacked over the second die. The second die can include a first through-silicon via (TSV) and a first circuit, and the third die can include a second TSV and a second circuit. The first TSV and the second TSV can be linearly coextensive. The first and second circuit can each be a logic circuit having a comparator and counter used to generate die identifiers. The counters of respective device die can be connected in series between the dice. Each die can be manufactured using the same masks but retain unique logical identifiers. A given die in a stack of dice can thereby be addressed by a single path in a same die layout.
Public/Granted literature
- US20220130818A1 LAYOUT DESIGN METHODOLOGY FOR STACKED DEVICES Public/Granted day:2022-04-28
Information query
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