Invention Grant
- Patent Title: Siloxane mitigation for laser systems
-
Application No.: US17867941Application Date: 2022-07-19
-
Publication No.: US11769986B2Publication Date: 2023-09-26
- Inventor: Bryan Lochman , Wang-Long Zhou , Francisco Villarreal-Saucedo , Bien Chann
- Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: H01S5/02235
- IPC: H01S5/02235 ; H01S5/40 ; H01S5/0222 ; H01S5/024 ; H01S5/30

Abstract:
In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
Public/Granted literature
- US20220352689A1 SILOXANE MITIGATION FOR LASER SYSTEMS Public/Granted day:2022-11-03
Information query