Invention Grant
- Patent Title: Extreme ultraviolet light generation system and electronic device manufacturing method
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Application No.: US17457342Application Date: 2021-12-02
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Publication No.: US11778721B2Publication Date: 2023-10-03
- Inventor: Yuichi Nishimura , Takayuki Yabu , Hiroaki Nakarai
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP 21007564 2021.01.20
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01S3/16 ; H01S3/13 ; H01S3/11

Abstract:
An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.
Public/Granted literature
- US20220232690A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2022-07-21
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