- 专利标题： Substrate positioning for deposition machine
-
申请号： US17451561申请日： 2021-10-20
-
公开(公告)号： US11780242B2公开(公告)日： 2023-10-10
- 发明人: Jerry Chang , Matt Audet
- 申请人： Kateeva, Inc.
- 申请人地址： US CA Newark
- 专利权人： Kateeva, Inc.
- 当前专利权人： Kateeva, Inc.
- 当前专利权人地址： US CA Newark
- 代理机构： Hauptman Ham, LLP
- 主分类号： B41J11/00
- IPC分类号： B41J11/00
摘要：
A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.
公开/授权文献
- US20220126606A1 SUBSTRATE POSITIONING FOR DEPOSITION MACHINE 公开/授权日：2022-04-28
信息查询
IPC分类:
