SUBSTRATE POSITIONING FOR DEPOSITION MACHINE

    公开(公告)号:US20220126606A1

    公开(公告)日:2022-04-28

    申请号:US17451561

    申请日:2021-10-20

    申请人: Kateeva, Inc.

    IPC分类号: B41J11/00

    摘要: A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.

    SUBSTRATE POSITIONING FOR DEPOSITION MACHINE

    公开(公告)号:US20240017555A1

    公开(公告)日:2024-01-18

    申请号:US18462261

    申请日:2023-09-06

    申请人: Kateeva, Inc.

    IPC分类号: B41J11/00

    CPC分类号: B41J11/00218

    摘要: A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.

    Substrate positioning for deposition machine

    公开(公告)号:US11780242B2

    公开(公告)日:2023-10-10

    申请号:US17451561

    申请日:2021-10-20

    申请人: Kateeva, Inc.

    IPC分类号: B41J11/00

    CPC分类号: B41J11/00218

    摘要: A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.