- 专利标题: Antireflection plate
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申请号: US17044614申请日: 2019-03-28
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公开(公告)号: US11796717B2公开(公告)日: 2023-10-24
- 发明人: Masahiro Saito , Daisuke Hayashi , Yu Arai
- 申请人: FUKUVI CHEMICAL INDUSTRY CO., LTD.
- 申请人地址: JP Fukui
- 专利权人: FUKUVI CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人: FUKUVI CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人地址: JP Fukui
- 代理机构: GREENBLUM & BERNSTEIN, P.L.C.
- 优先权: JP 18080725 2018.04.19
- 国际申请: PCT/JP2019/013696 2019.03.28
- 国际公布: WO2019/202942A 2019.10.24
- 进入国家日期: 2020-10-01
- 主分类号: G02B1/111
- IPC分类号: G02B1/111 ; G02B1/14 ; B32B27/30 ; B32B27/36 ; B32B27/08 ; G02B1/18
摘要:
An antireflection plate has a structure in which a hard coat layer, an antireflective layer having a low refractive index layer, a protective layer, and an overcoat layer are laminated in this order on a transparent resin substrate. The low refractive index layer is a cured body of a curable composition containing 50 to 200 parts by mass of (B-2) hollow silica fine particles, and the low refractive index layer has a refractive index of 1.20 to 1.45. The protective layer is a cured body of a curable composition containing 7.5 to 35 parts by mass of (B-3) spherical silica fine particles, and the protective layer has a thickness of 10 to 15 nm and a refractive index of 1.45 to 1.50. The overcoat layer includes a polymer of a fluorine-containing silicon compound.
公开/授权文献
- US20210103073A1 ANTIREFLECTION PLATE 公开/授权日:2021-04-08
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