Invention Grant
- Patent Title: Strained ferromagnetic hall metal SOT layer
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Application No.: US17144958Application Date: 2021-01-08
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Publication No.: US11805705B2Publication Date: 2023-10-31
- Inventor: Shy-Jay Lin , Chien-Min Lee , MingYuan Song
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H10N52/80
- IPC: H10N52/80 ; H10B61/00 ; H10N52/00 ; H10N52/01

Abstract:
A magnetic memory device includes a spin-orbit torque (SOT) induction structure which may be strained and seedless and formed with a perpendicular magnetic anisotropy. A magnetic tunnel junction (MTJ) stack is disposed over the SOT induction structure. A spacer layer may decouple layers between the SOT induction structure and the MTJ stack or decouple layers within the MTJ stack. One end of the SOT induction structure may be coupled to a first transistor and another end of the SOT induction structure coupled to a second transistor.
Public/Granted literature
- US20210359199A1 STRAINED FERROMAGNETIC HALL METAL SOT LAYER Public/Granted day:2021-11-18
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